David Alexander Ure
Fondateur chez Irresistible Materials Ltd.
Profil
David Alexander Ure is the founder.
He founded Inanovate, Inc. in 2007 and currently holds the title of Chairman.
He also founded Irresistible Materials Ltd.
in 2010 and currently holds the title of Director.
Mr. Ure's education includes an MBA from Babson College and a graduate degree from the University of Birmingham.
Postes actifs de David Alexander Ure
| Sociétés | Poste | Début |
|---|---|---|
Irresistible Materials Ltd.
 Irresistible Materials Ltd. Electronics/AppliancesConsumer Durables Irresistible Materials Ltd. develops next generation of photo-resist materials the semiconductor industry. The firm's photo-resist is a material that undergoes a change in its physical and chemical properties upon exposure to radiation that allows for the formation of a relief pattern in a material. The company was founded by Elwyn Shelley, Alex Robinson and David Alexander Ure in 2010 and is headquartered in Swansea Waterfront, the United Kingdom. | Fondateur | 01/01/2010 |
Inanovate, Inc.
 Inanovate, Inc. Information Technology ServicesTechnology Services Inanovate, Inc. provides protein screening services. Its product include Bio-ID, a multiplexed protein quantification platform which, in real-time, measures protein concentrations from matrices. The company was founded by David Alexander Ure and David J Arslanian in 2007 and is headquartered in Sioux Falls, SD. | Fondateur | 01/01/2007 |
Formation de David Alexander Ure
| Babson College | Masters Business Admin |
| University of Birmingham | Graduate Degree |
Expériences
Fonctions occupées
Actives
Inactives
Sociétés cotées
Entreprise privées
Relations
Relations au 1er degré
Entreprises liées au 1er degré
Homme
Femme
Administrateurs
Exécutifs
Sociétés liées
| Entreprise privées | 2 |
|---|---|
Irresistible Materials Ltd.
Irresistible Materials Ltd. Electronics/AppliancesConsumer Durables Irresistible Materials Ltd. develops next generation of photo-resist materials the semiconductor industry. The firm's photo-resist is a material that undergoes a change in its physical and chemical properties upon exposure to radiation that allows for the formation of a relief pattern in a material. The company was founded by Elwyn Shelley, Alex Robinson and David Alexander Ure in 2010 and is headquartered in Swansea Waterfront, the United Kingdom. | Consumer Durables |
Inanovate, Inc.
Inanovate, Inc. Information Technology ServicesTechnology Services Inanovate, Inc. provides protein screening services. Its product include Bio-ID, a multiplexed protein quantification platform which, in real-time, measures protein concentrations from matrices. The company was founded by David Alexander Ure and David J Arslanian in 2007 and is headquartered in Sioux Falls, SD. | Technology Services |
